![Figure 1 from BEOL compatible 2D layered materials as ultra-thin diffusion barriers for Cu interconnect technology | Semantic Scholar Figure 1 from BEOL compatible 2D layered materials as ultra-thin diffusion barriers for Cu interconnect technology | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/7ce26bfef35c588bdee75ef7a8dd4b8c68f6e718/2-Figure1-1.png)
Figure 1 from BEOL compatible 2D layered materials as ultra-thin diffusion barriers for Cu interconnect technology | Semantic Scholar
![Ultralow diffusion barrier of double transition metal MoWC monolayer as Li-ion battery anode | SpringerLink Ultralow diffusion barrier of double transition metal MoWC monolayer as Li-ion battery anode | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1007%2Fs10853-022-07237-1/MediaObjects/10853_2022_7237_Figa_HTML.png)
Ultralow diffusion barrier of double transition metal MoWC monolayer as Li-ion battery anode | SpringerLink
![Entropy | Free Full-Text | Diffusion Barrier Performance of AlCrTaTiZr/AlCrTaTiZr-N High-Entropy Alloy Films for Cu/Si Connect System Entropy | Free Full-Text | Diffusion Barrier Performance of AlCrTaTiZr/AlCrTaTiZr-N High-Entropy Alloy Films for Cu/Si Connect System](https://www.mdpi.com/entropy/entropy-22-00234/article_deploy/html/images/entropy-22-00234-g008.png)
Entropy | Free Full-Text | Diffusion Barrier Performance of AlCrTaTiZr/AlCrTaTiZr-N High-Entropy Alloy Films for Cu/Si Connect System
![Characteristics of an Amorphous Carbon Layer as a Diffusion Barrier for an Advanced Copper Interconnect | ACS Applied Materials & Interfaces Characteristics of an Amorphous Carbon Layer as a Diffusion Barrier for an Advanced Copper Interconnect | ACS Applied Materials & Interfaces](https://pubs.acs.org/cms/10.1021/acsami.9b15562/asset/images/medium/am9b15562_0008.gif)
Characteristics of an Amorphous Carbon Layer as a Diffusion Barrier for an Advanced Copper Interconnect | ACS Applied Materials & Interfaces
Power generation from the Cu26Nb2Ge6S32-based single thermoelectric element with Au diffusion barrier - Journal of Materials Chemistry C (RSC Publishing)
![Figure 1 from Atomically thin diffusion barriers for ultra-scaled Cu interconnects implemented by 2D materials | Semantic Scholar Figure 1 from Atomically thin diffusion barriers for ultra-scaled Cu interconnects implemented by 2D materials | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/d37abb3367117c1e23b71c32cd60a8a76a617709/1-Figure1-1.png)
Figure 1 from Atomically thin diffusion barriers for ultra-scaled Cu interconnects implemented by 2D materials | Semantic Scholar
![Analysis of Al diffusion processes in TiN barrier layers for the application in silicon solar cell metallization: Journal of Applied Physics: Vol 120, No 2 Analysis of Al diffusion processes in TiN barrier layers for the application in silicon solar cell metallization: Journal of Applied Physics: Vol 120, No 2](https://aip.scitation.org/action/showOpenGraphArticleImage?doi=10.1063/1.4954684&id=images/medium/1.4954684.figures.f7.gif)
Analysis of Al diffusion processes in TiN barrier layers for the application in silicon solar cell metallization: Journal of Applied Physics: Vol 120, No 2
![Diffusion barrier during the lithiation/delithiation process for (a)... | Download Scientific Diagram Diffusion barrier during the lithiation/delithiation process for (a)... | Download Scientific Diagram](https://www.researchgate.net/publication/321482014/figure/fig4/AS:613868837564436@1523369144894/Diffusion-barrier-during-the-lithiation-delithiation-process-for-a-monolayer-a-1-and.png)
Diffusion barrier during the lithiation/delithiation process for (a)... | Download Scientific Diagram
![Large‐Area Uniform 1‐nm‐Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A “Next‐Generation” Cu Diffusion Barrier? - Kang - 2022 - Advanced Materials - Wiley Online Library Large‐Area Uniform 1‐nm‐Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A “Next‐Generation” Cu Diffusion Barrier? - Kang - 2022 - Advanced Materials - Wiley Online Library](https://onlinelibrary.wiley.com/cms/asset/b0d9844b-7b0a-4fe8-b4fe-c14d381e61f8/adma202110454-fig-0001-m.jpg)
Large‐Area Uniform 1‐nm‐Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A “Next‐Generation” Cu Diffusion Barrier? - Kang - 2022 - Advanced Materials - Wiley Online Library
![Barriers Against Copper Diffusion into Silicon and Drift Through Silicon Dioxide | MRS Bulletin | Cambridge Core Barriers Against Copper Diffusion into Silicon and Drift Through Silicon Dioxide | MRS Bulletin | Cambridge Core](https://static.cambridge.org/content/id/urn%3Acambridge.org%3Aid%3Aarticle%3AS0883769400047710/resource/name/S0883769400047710_Uequ1.gif?pub-status=live)
Barriers Against Copper Diffusion into Silicon and Drift Through Silicon Dioxide | MRS Bulletin | Cambridge Core
Studies of two-dimensional h-BN and MoS2 for potential diffusion barrier application in copper interconnect technology
![a) The corresponding potential diffusion barrier profiles of Na on Zr... | Download Scientific Diagram a) The corresponding potential diffusion barrier profiles of Na on Zr... | Download Scientific Diagram](https://www.researchgate.net/publication/325803100/figure/fig3/AS:650099491348485@1532007205995/a-The-corresponding-potential-diffusion-barrier-profiles-of-Na-on-Zr-2-C-Zr-3-C-2-Zr.png)
a) The corresponding potential diffusion barrier profiles of Na on Zr... | Download Scientific Diagram
![Review of Graphene as a Solid State Diffusion Barrier - Morrow - 2016 - Small - Wiley Online Library Review of Graphene as a Solid State Diffusion Barrier - Morrow - 2016 - Small - Wiley Online Library](https://onlinelibrary.wiley.com/cms/asset/6e91a5f8-cfd5-4ad2-9f96-b8f479a7d3fd/smll201501120-fig-0002-m.jpg)
Review of Graphene as a Solid State Diffusion Barrier - Morrow - 2016 - Small - Wiley Online Library
![May 1, 2015 – Fluorinated Epitaxial Graphene Diffusion Barrier on Germanium Enables Ge-MOSFET without Unstable Germanium Oxide - IEEE Nanotechnology Council May 1, 2015 – Fluorinated Epitaxial Graphene Diffusion Barrier on Germanium Enables Ge-MOSFET without Unstable Germanium Oxide - IEEE Nanotechnology Council](https://ieeenano.org/wp-content/uploads/2015/05/F-Gr-on-Ge-as-Diffusion-Barrier.jpg)
May 1, 2015 – Fluorinated Epitaxial Graphene Diffusion Barrier on Germanium Enables Ge-MOSFET without Unstable Germanium Oxide - IEEE Nanotechnology Council
![Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom – Atomic Limits Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom – Atomic Limits](https://i0.wp.com/www.atomiclimits.com/wp-content/uploads/2022/04/TOC-1.png?resize=738%2C355&ssl=1)